[PA-1-4] Low-Temperature Chemical-Vapor-Deposition of Silicon-Nitride Film from Hexachloro-Disilane and Hydrazine

W. C. Yeh、R. Ishihara、S. Morishita、M. Matsumura (1.Department of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1995.PA-1-4