Excellent Quality of SiO2 Dielectric Film Prepared by Room-Temperature Ion Plating and Its Application to Thin-Film Transistors

Tai-Ju Chen; Ching-Fa Yeh; Ching-Lin Fan; Jiann-Shiun Kao

doi:https://doi.org/10.7567/SSDM.1995.PA-1-5

[PA-1-5] Excellent Quality of SiO2 Dielectric Film Prepared by Room-Temperature Ion Plating and Its Application to Thin-Film Transistors

Tai-Ju Chen、Ching-Fa Yeh、Ching-Lin Fan、Jiann-Shiun Kao (1.Department of Electronics Engineering & Institute of Electronics, National Chiao-Tung University、2.Precision Instrument Development Center, National Science Council)

https://doi.org/10.7567/SSDM.1995.PA-1-5

1995 International Conference on Solid State Devices and Materials

[PA-1-5] Excellent Quality of SiO2 Dielectric Film Prepared by Room-Temperature Ion Plating and Its Application to Thin-Film Transistors