[PC-11-1] A 0.25μm CMOSFET Using Halo Implantation for 1Gb DRAM

Dongjin JUNG, Jaekwan PARK, Kangyoon LEE, Namsoo KANG, Kinam KIM, Taeearn SHIM, Jongwoo PARK (1.R & D Center, Samsung Electronics, Co., LTD.)

https://doi.org/10.7567/SSDM.1995.PC-11-1