[PC-11-1] A 0.25μm CMOSFET Using Halo Implantation for 1Gb DRAM

Dongjin JUNG、Jaekwan PARK、Kangyoon LEE、Namsoo KANG、Kinam KIM、Taeearn SHIM、Jongwoo PARK (1.R & D Center, Samsung Electronics, Co., LTD.)

https://doi.org/10.7567/SSDM.1995.PC-11-1