The Japan Society of Applied Physics

[PC-12-2] A Novel Planarization of Trench Isolation Using a Polysilicon Layer As a Self-Aligned Mask

Juing-Yi Cheng、Tan Fu Lei、Tien Sheng Chao、Daniel L. W. Yen、B. Y. Jin、C. J. Lin (1.Department of Electronics Engineering and Institute of Electronics National Chiao Tung University and、2.National Nano Device Laboratory、3.Macronix International Co., LTD.)

https://doi.org/10.7567/SSDM.1995.PC-12-2