[PC-12-3] Dry O2 Hgh Pressure Field Oxidation for 0.25 μm Isolation Technology Viju K. MATHEWS、Pierre C. FAZAN、Nanseng JENG、Sang S. KIM、Alan EMAMI (1.Micron Technology, Inc.、2.Gasonics International) https://doi.org/10.7567/SSDM.1995.PC-12-3