Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors

Chun-Yen Chang; Hsiao-Yi Lin; Jyh-Chang Hwu; Juing-Yi Cheng; Tan Fu Lei; Liang-Po Chen; Bau-Tong Dai

doi:https://doi.org/10.7567/SSDM.1995.PC-13-2

[PC-13-2] Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors

Chun-Yen Chang, Hsiao-Yi Lin, Jyh-Chang Hwu, Juing-Yi Cheng, Tan Fu Lei, Liang-Po Chen, Bau-Tong Dai (1.Department of Electronics Engineering & Institute of Electronics, National Chiao Tung University, 2.National Nano Device Laboratory)

https://doi.org/10.7567/SSDM.1995.PC-13-2

1995 International Conference on Solid State Devices and Materials

[PC-13-2] Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors