Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors

Chun-Yen Chang; Hsiao-Yi Lin; Jyh-Chang Hwu; Juing-Yi Cheng; Tan Fu Lei; Liang-Po Chen; Bau-Tong Dai

doi:https://doi.org/10.7567/SSDM.1995.PC-13-2

[PC-13-2] Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors

Chun-Yen Chang、Hsiao-Yi Lin、Jyh-Chang Hwu、Juing-Yi Cheng、Tan Fu Lei、Liang-Po Chen、Bau-Tong Dai (1.Department of Electronics Engineering & Institute of Electronics, National Chiao Tung University、2.National Nano Device Laboratory)

https://doi.org/10.7567/SSDM.1995.PC-13-2

1995 International Conference on Solid State Devices and Materials

[PC-13-2] Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors