The Japan Society of Applied Physics

[PC-3-7] New Characterization of TiSi2 Local Wiring Technology and Its Impact on Low Power / High Speed Quarter Micron CMOS

Atsushi OHTOMO、Jiro IDA、Nobuo OZAWA、Makiko KAGEYAMA、Hiroshi ONODA (1.VLSI Research and Development Center, OKI Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1995.PC-3-7