Effects of Channel Thickness on Poly-Crystalline Silicon Thin Film Transistors

Mitsutoshi MIYASAKA; Tadakazu KOMATSU; Wataru ITOH; Akemi YAMAGUCHI; Hiroyuki OHSHIMA

doi:https://doi.org/10.7567/SSDM.1995.PC-8-1

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜 1995年8月24日
International House, Osaka, Japan

[PC-8-1] Effects of Channel Thickness on Poly-Crystalline Silicon Thin Film Transistors

Mitsutoshi MIYASAKA、Tadakazu KOMATSU、Wataru ITOH、Akemi YAMAGUCHI、Hiroyuki OHSHIMA (1.SEIKO EPSON CORPORATION Active Device Research Laboratory / Analysis Center)

https://doi.org/10.7567/SSDM.1995.PC-8-1

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