[PD-L1-L9] ULSI Technology Evaluation and Precautions: A Novel View of SiO2 Layer Properties in the nano- and Sub-Nanoscale

O. V. Romanov、I. A. Kotov、Hee-Chul Lee (1.St. -Petersburg Univ.、2.El. Eng. Dept., KAIST)

https://doi.org/10.7567/SSDM.1995.PD-L1-L9