Application of CVD SiO2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories

T. Kobayashi; M. Ushiyama; N. Miyamoto; J. Yugami; H. Kume; K. Kimura

doi:https://doi.org/10.7567/SSDM.1995.S-I-4-2

1995 International Conference on Solid State Devices and Materials

Aug 21, 1995 - Aug 24, 1995
International House, Osaka, Japan

[S-I-4-2] Application of CVD SiO2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories

T. Kobayashi, M. Ushiyama, N. Miyamoto, J. Yugami, H. Kume, K. Kimura (1.Central Research Laboratory, Hitachi, Ltd., 2.Hitachi Device Engineering Co.)

https://doi.org/10.7567/SSDM.1995.S-I-4-2

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