[S-I-4-2] Application of CVD SiO2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories
T. Kobayashi、M. Ushiyama、N. Miyamoto、J. Yugami、H. Kume、K. Kimura
(1.Central Research Laboratory, Hitachi, Ltd.、2.Hitachi Device Engineering Co.)
https://doi.org/10.7567/SSDM.1995.S-I-4-2
