Impact of Negative-Bias Temperature Instability on the Lifetime of Single-Gate CMOS Structures with Ultrathin(4-6 nm)Gate Oxides

[S-I-7-3] Impact of Negative-Bias Temperature Instability on the Lifetime of Single-Gate CMOS Structures with Ultrathin(4-6 nm)Gate Oxides

Shigeo OGAWA, Masakazu SHIMAYA, Noboru SHIONO (1.NTT LSI Laboratories, 2.Reliability Center for Electronic Components of Japan (RCJ))