[S-I-7-3] Impact of Negative-Bias Temperature Instability on the Lifetime of Single-Gate CMOS Structures with Ultrathin(4-6 nm)Gate Oxides

Shigeo OGAWA、Masakazu SHIMAYA、Noboru SHIONO (1.NTT LSI Laboratories、2.Reliability Center for Electronic Components of Japan (RCJ))

https://doi.org/10.7567/SSDM.1995.S-I-7-3