[S-I-8-1] Thermal Budget for Fabricating A Dual Gate Deep-Submicron CMOS with Thin Pure Gate Oxide

Kunihiro Suzuki、Akira Satoh、Takayuki Aoyama、Itaru Namura、Fumihiko Inoue、Yuji Kataoka、Yoko Tada、Toshihiro Sugii (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1995.S-I-8-1