[S-IV-4] W as a BIT Line Interconnection in COB Structured DRAM and Feasible Diffusion Barrier Layer

Jeong Soo Byun、Jun Ki Kim、Jin Won Park、Jae Jeong Kim (1.ULSI Laboratory of LG Semicon Co. Ltd.)

https://doi.org/10.7567/SSDM.1995.S-IV-4