[B-1-3] RIE-Lag Reduction by NH3 Addition in Aluminum Alloy Etching under BCl3/Cl2 Chemistry

Michinari YAMANAKA、Hideo NAKAGAWA、Masafumi KUBOTA (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1996.B-1-3