[B-1-4] Double Spacer LOCOS Process with Shallow Recess of Silicon for 0.20 μm Isolation

Byung-Jin Cho, Se-Aug Jang, Tae-Sik Song, Seung-Ho Pyi, Jong-Choul Kim (1.Memory R&D Div., HYUNDAI Electronics Ind. Co. Ltd.)

https://doi.org/10.7567/SSDM.1996.B-1-4