[PC-5-6] Enhancement and Suppression of Band-to-Band Tunneling Current in Ultra-Thin nMOSFETs/SIMOX: Influence of Superficial Si Layer Thickness and It's Future Prospect

Toshihiko Ishiyama、Yasuhisa Omura (1.NTT LSI Laboratories)

https://doi.org/10.7567/SSDM.1996.PC-5-6