[PC-8-4] Effect of ECR CVD SiO2 Film Deposition on Ferroelectric Properties of Pt/PZT/Pt Capacitor

Sejun Oh、In Seun Park、Byueng Hee Kim、Sang Min Lee、Jong Moon、Sang In Lee、Moon Yong Lee (1.Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd)

https://doi.org/10.7567/SSDM.1996.PC-8-4