Electrical Characteristics of Ultra-Fine Trench Isolation Fabricated by a New Two-Step Filling Process

K. Shiozawa; T. Oishi; H. Maeda; T. Murakami; K. Yasumura; Y. Abe; Y. Tokuda

doi:https://doi.org/10.7567/SSDM.1996.PD-4-4

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜 1996年8月29日
Pacifico Yokohama, Yokohama, Japan

[PD-4-4] Electrical Characteristics of Ultra-Fine Trench Isolation Fabricated by a New Two-Step Filling Process

K. Shiozawa、T. Oishi、H. Maeda、T. Murakami、K. Yasumura、Y. Abe、Y. Tokuda (1.Advanced Technology R&D Center, ULSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1996.PD-4-4

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