[A-10-4] W-Plug Common Contact with CoSi2 Ohmic Layer for Scaled DRAM and Merged DRAM in Logic (MDL) Devices

Siyoung Choi、Bong-Young Yoo、Hyeon-Deok Lee、Ho-Kyu Kang、Moon-Yong Lee (1.L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.)

https://doi.org/10.7567/SSDM.1997.A-10-4