[A-2-1] Highly Reliable SiO2 Films Formed by UV-O2 Oxidation Akinobu Teramoto、Kiyoteru Kobayashi、Yoshikazu Ohno、Makoto Hirayama (1.Mitsubishi Electric Corporation, ULSI Laboratory) https://doi.org/10.7567/SSDM.1997.A-2-1
