[A-2-5] Scaling of Flash Memory Interpoly Dielectrics Using NH3-Annealed CVD SiO2 Single-Layer Films

T. Kobayashi、A. Katayama、H. Kume、K. Kimura (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1997.A-2-5