[A-6-1] Novel Ultra Clean Salicide Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1 μm Gate Electrode

M. Nakano, H. Kotaki, K. Kataoka, S. Kakimoto (1.Central Research Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1997.A-6-1