[A-6-1] Novel Ultra Clean Salicide Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1 μm Gate Electrode

M. Nakano、H. Kotaki、K. Kataoka、S. Kakimoto (1.Central Research Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1997.A-6-1