[B-11-10] Characteristics of Nanoscale Lithography Using Atomic Force Microscope with Current-Controlled Exposure System

Masayoshi Ishibashi, Seiji Heike, Hiroshi Kajiyama, Yasuo Wada, Tomihiro Hashizume (1.Advanced Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1997.B-11-10