Characteristics of Nanoscale Lithography Using Atomic Force Microscope with Current-Controlled Exposure System

1997 International Conference on Solid State Devices and Materials

Sep 16, 1997 - Sep 19, 1997
ACT CITY Hamamatsu, Hamamatsu, Japan

Masayoshi Ishibashi, Seiji Heike, Hiroshi Kajiyama, Yasuo Wada, Tomihiro Hashizume (1.Advanced Research Laboratory, Hitachi, Ltd.)