[B-11-10] Characteristics of Nanoscale Lithography Using Atomic Force Microscope with Current-Controlled Exposure System
Masayoshi Ishibashi、Seiji Heike、Hiroshi Kajiyama、Yasuo Wada、Tomihiro Hashizume
(1.Advanced Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1997.B-11-10
