[B-5-2] Suppressing Plasma Induced Degradation of Gate Oxide by Using Silicon-On-Insulator Structures

Kiyoshi Arita、Masashi Akamatsu、Tanemasa Asano (1.Center for Microelectronic Systems, Kyushu Institute of Technology)

https://doi.org/10.7567/SSDM.1997.B-5-2