[C-10-4] Fabrication of Metal-Ferroelectric-Insulator-Semiconductor Field Effect Transistor (MEFISFET) Using Pt-SrBi2Ta2O9-Y2O3-Si Structure

Ho Nyung Lee, Yong Tae Kim, Chang Woo Lee, Myoung-Ho Lim, T. S. Kalkur (1.Semiconductor Materials Laboratory, Korea Institute of Science and Technology, 2.Department of Physics, Korea University, 3.Department of Electrical and Computer Eng., Colorado State University at Colorado Springs)

https://doi.org/10.7567/SSDM.1997.C-10-4