[C-13-2] Optimization of Process Conditions for Quarter Micron Recessed Poly-Si Spacer LOCOS (RPSL) Isolation

S. J. Hong、D. H. Ahn、S. E. Kim、T. Park、Y. G. Shin、H. K. Kang、M. Y. Lee (1.Semiconductor Research Center, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.1997.C-13-2