[C-13-2] Optimization of Process Conditions for Quarter Micron Recessed Poly-Si Spacer LOCOS (RPSL) Isolation

S. J. Hong, D. H. Ahn, S. E. Kim, T. Park, Y. G. Shin, H. K. Kang, M. Y. Lee (1.Semiconductor Research Center, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.1997.C-13-2