[C-8-4] Dry Thermal Oxidation of Polycrystalline and Amorphous Silicon Films for Application to Thin Film Transistors

Mitsutoshi MIYASAKA、Hiroyuki OHSHIMA、Tatsuya SHIMODA (1.Seiko Epson Corporation, Base Technology Research Center)

https://doi.org/10.7567/SSDM.1997.C-8-4