Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process

Nobuyuki Kawakami; Yasuyuki Aoki; Toshihiro Kugimiya; Kentaro Shibahara; Shin Yokoyama

doi:https://doi.org/10.7567/SSDM.1997.D-7-3

[D-7-3] Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process

Nobuyuki Kawakami、Yasuyuki Aoki、Toshihiro Kugimiya、Kentaro Shibahara、Shin Yokoyama (1.Research Center for Nanodevices and Systems, Hiroshima University、2.Electronics and Information Technology Laboratory, Kobe Steel Ltd.)

https://doi.org/10.7567/SSDM.1997.D-7-3

1997 International Conference on Solid State Devices and Materials

[D-7-3] Influence of Wafer Material on Defect Generation During Deep Submicron LOCOS Process