The Japan Society of Applied Physics

[A-7-3] Vertical Scaling of Metal/High-k Gate Stacked MOSFETs for Hp45 and Beyond

T. Matsuki1, T. Watanabe1, T. Morooka1, M. Sato1, M. Kadoshima1, T. Onizawa1, T. Eimori1, M. Nakamura1, Y. Nara1, Y. Ohji1 (1.Selete, Japan)

https://doi.org/10.7567/SSDM.2008.A-7-3