[A-7-3] Vertical Scaling of Metal/High-k Gate Stacked MOSFETs for Hp45 and Beyond

T. Matsuki¹、T. Watanabe¹、T. Morooka¹、M. Sato¹、M. Kadoshima¹、T. Onizawa¹、T. Eimori¹、M. Nakamura¹、Y. Nara¹、Y. Ohji¹ (1.Selete, Japan)

https://doi.org/10.7567/SSDM.2008.A-7-3