[A-8-3] Dual Metal Gate Technology with Metal Inserted FUSI Stack (MIFS) using Single Phase FUSI for Scaled High-k CMOSFETs

M. Kadoshima¹, T. Matsuki¹, T. Aminaka¹, E. Kurosawa¹, M. Kitajima¹, T. Aoyama¹, Y. Nara¹, Y. Ohji¹ (1.Selete, Japan)

https://doi.org/10.7567/SSDM.2008.A-8-3