[A-8-3] Dual Metal Gate Technology with Metal Inserted FUSI Stack (MIFS) using Single Phase FUSI for Scaled High-k CMOSFETs

M. Kadoshima¹、T. Matsuki¹、T. Aminaka¹、E. Kurosawa¹、M. Kitajima¹、T. Aoyama¹、Y. Nara¹、Y. Ohji¹ (1.Selete, Japan)

https://doi.org/10.7567/SSDM.2008.A-8-3