[A-8-4] Hybrid Gate Structures of NMOS : Poly-Si / PMOS : 2 Layers Ni-FUSI by using Flash Lamp Anneal (FLA) and CMP

H. Ohta¹、S. Akiyama²、H. Fukutome¹、K. Ookubo²、K. Kawamura²、N. Idani²、S. Satoh¹ (1.Fujitsu Labs. Ltd.、2.Fujitsu Microelectronics Ltd., Japan)

https://doi.org/10.7567/SSDM.2008.A-8-4