[B-9-4] Effect of Poly/SiON Gate Stack Combined with Thin BOX and Ground Plane for Low Vth and Analog Applications of FDSOI Devices
C. Fenouillet-Beranger1,2, P. Perreau1,2, S. Kohler1, F. Arnaud1, M. Cassé2, X. Garros2, C. Laviron1,2, P. Garnier1, P. Rivallin2, D. Chanemougame1, R. Beneyton1, A. Torres1,2, D. Barge1, N. Cherault1, P. Gouraud1, F. Leverd1, E. Deloffre1, M. Gros-Jean1, N. Loubet1, F. Abbate1, M. Fournier1, M. Gattefait1, J. D. Chapon1, B. Le-Gratiet1, M. Gregoire1, J. Bienacel1, P. Gros1, N. Kubler1, G. Guierleo1, C. Mezzomo1, M. Marin1, C. Leyris1, R. Pantel1, O. Faynot2, C. Buj2, F. Andrieu2, S. Barnola2, T. Salvetat2, S. Denorme1, S. Deleonibus2, T. Skotnicki1
(1.STMicroelectronics, 2.CEA-LETI/MINATEC, France)
https://doi.org/10.7567/SSDM.2008.B-9-4