[H-1-2] Fabrication of N-type and P-type Schottky Barrier Thin-Film-Transistors Crystallized by Excimer Laser Annealing and Solid Phase Crystallization Method

J. W. Shin¹、C. J. Choi²、W. J. Cho¹ (1.Kwangwoon Univ.、2.Chonbuk Univ., Korea)

https://doi.org/10.7567/SSDM.2008.H-1-2