[H-9-3] Fabrication and Characterization of CdF₂/CaF₂ Resonant Tunneling Floating Gate Metal-oxide-semiconductor Field Effect Transistor Structures

M. Watanabe¹、T. Wada¹ (1.Tokyo Tech., Japan)

https://doi.org/10.7567/SSDM.2008.H-9-3