[J-1-5] Electrical Characteristics of TiO₂/Al₂O₃/TiO₂ Stacked Films

H. Hara¹、M. Tanioku²、M. Yamato¹、T. Kikkawa¹ (1.Hiroshima Univ.、2.Elpida Memory, Inc., Japan)

https://doi.org/10.7567/SSDM.2008.J-1-5