Electrical Stress-Induced Degradation of HfAlO and HfO<sub>2</sub> Films of Equal EOT

P. Samanta; Y. J. Lee; C. L. Cheng; M. Chan

doi:https://doi.org/10.7567/SSDM.2008.P-1-11

2008 International Conference on Solid State Devices and Materials

2008年9月23日〜 2008年9月26日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[P-1-11] Electrical Stress-Induced Degradation of HfAlO and HfO₂ Films of Equal EOT

P. Samanta^1,2、Y. J. Lee³、C. L. Cheng⁴、M. Chan² (1.Vidyasagar College for Women, India、2.Hong Kong Univ. of Sci. and Tech., China、3.National Nano Device Labs.、4.National Formosa Univ., Taiwan)

https://doi.org/10.7567/SSDM.2008.P-1-11

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2008 International Conference on Solid State Devices and Materials

[P-1-11] Electrical Stress-Induced Degradation of HfAlO and HfO2 Films of Equal EOT

[P-1-11] Electrical Stress-Induced Degradation of HfAlO and HfO₂ Films of Equal EOT