[P-1-14] Optimization of the First Reaction in ALD and its Impact to Electrical Film Quality of High-k/Si Direct-contact Gate Stacks

Y. Morita¹、S. Migita¹、H. Ota¹ (1.MIRAI-NIRC, AIST, Japan)

https://doi.org/10.7567/SSDM.2008.P-1-14