[P-1-18] Negative Bias Temperature Instability (NBTI) of pMOSFETs with Novel HfxMoyNz Metal Gate Electrodes H. K. Peng1, C. S. Lai1, K. M. Fan1, S. J. Lin2 (1.Chang Gung Univ., 2.Nanya Tech. Corp., Taiwan) https://doi.org/10.7567/SSDM.2008.P-1-18