[P-1-7] Low-Temperature Polycrystalline Silicon Thin-Film-Transistor with Fluorinated High-k HfO₂ Gate Dielectrics by HF Dip and CF₄ Plasma

C. W. Chen¹、C. S. Lai¹ (1.Chang Gung Univ., Taiwan)

https://doi.org/10.7567/SSDM.2008.P-1-7