[P-2-6] Vapor Phase Silylation Hardening Process for Porous Silica Low-k Films

Y. Nakata¹, Y. Kayaba¹, T. Hirota², T. Kikkawa¹ (1.Hiroshima Univ., 2.TAZMO, Inc., Japan)

https://doi.org/10.7567/SSDM.2008.P-2-6